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1800℃ High Purity MoSi2 High Temperature Heating Element For Sintering Furnace

  • Origin: China
  • Supply Type: in stock
  • Processing Time: 7-30 days

Supplier Info.

  • Company Name Summer Song Company
  • Membership:Free
  • Business Type: Manufacturer, Trading Company, Buying Office, Agent, Distributor/Wholesaler, Government ministry/Bureau/Commission, Association, Business Service (Transportation, finance, travel, Ads, etc), Other
  • Employees Total
  • Annual Revenue

Heating r>

MoSi2 is a conductive silicide that is oxidation-resistant because of the formation of stable silica layers on its surfaces at high temperatures.

MoSi2 has been produced as an electric heating n air, at temperatures beyond 1600 °C. A known commercial MoSi2 heating , which is made by bonding a mixture of MoSi2 particles together with an aluminosilicate glass se, usually as 20% of the total volume.

Although top-grade MoSi2 tion at temperatures of up to 1800 °C, the material is highly brittle and can suffer severely from creep during use. However, they offer process benefits as they can work at high electrical loads without aging, and do not exhibit increasing electrical resistivity during use. They are oxidation-resistant in air, oxygen, and oxygen-rich atmosres.

Moreover, they can be used with ammonia, nitrogen, hydrogen, noble gases, and limited vacuum, but operating temperatures and service life may be decreased because of the failure of the protective oxide layer.

MoSi2 readymade manufactured as either bent or straight forms, in an extensive range of dimensions. The arily used in production furnaces and laboratory furnaces in the ceramics, glass, steel, electronics, and heat-treatment sectors.

AtmosreMax. re
MS1700MS1800
Air1700℃1800℃
Nitrogen1600℃1700℃
Argon, Helium1600℃1700℃
Hydrogen1100-1450℃1100-1450℃
N2/H2 95/5%1250-1600℃1250-1600℃

Chemical Properties of sical Properties of Mosi2 Heating Rod

Oxygen-resistance under high temperature: in oxidizing atmosre, a layer of compact quartz protective film is formed on the surface of the high temperature combustion, which prevent Mosi2 from oxidizing more. When the re is higher than 1700 °C, the film becomes melting. It’s not suitable for long time use in the temperature range of 400-700°C, otherwise, the owdering for the strong oxidation under low temperature.

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