Magnetron sputtering system with 600 degree celsius /10-8Pa

Applications:

Ultrahigh vacuum 4-target magnetron sputtering system is designed for depostion of thin film , be used in scientific research of institutes or universities.

Specifications:

SPECIAL DESIGN IS AVILABLE.

Vacuum chamber: &;400mm &;500mm &;600mm &;800mm 1000X1200X300

Ultimate vacuum : &;50-&;200, totally up to 4 targets; DC and RF compatible, Water cooled

Options: Retanggular target 300X120

Cylindrical target &;76X300-700

Electromagnetic target &;70

Sample size: &;50-&;150, &;200X300

Temperature range RT-600°c

Cooling, heating, anti sputtering clean, revolution and rotation can be realized.

Options: Film thickness monitoring, reaction sputtering ,Ion beam enhanced magnetron sputtering

SHENYANG HUIYU VACUUM TECHNICS CO.LTD

www.syhyzk.com Tel 8

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Vacuum assembly :

Ultrahigh Vacuum metal View Port with glass sealed

Angle valve

magnetic derict rotation shaft

magnetic sample transfer device

MBE Knudsen Evaporation /span>

Ultrahigh Vacuum Flange

Ceramic Feedthrough

Ultrahigh Vacuum Welded Bellows Ultrahigh vaccum Highprecision Four-freedom Munipulator

Ultrahigh vacuum Gate Valve

Ultrahigh Vaccum Seal Copper Gasket

Four-Freedom Sample Munipulator

Ultrahigh vaccum Highprecision Four-freedom Munipulator Multi-freedom Sample table

Vacuum Pressure Impregnation Equipment VPI

Accelerator accembly

Angle-resolved toemission spectroscopy beam-ce

Beamstopper

Faraday cup

Viewing screen target

Slit

Accelerator probe

RF Cavity at heavy Ion Cycloron

Time-of-flight probe

Medical

Primary collimator for heavy ion beam

Ridge Filter for heavy-ion beam therapy