Introduction
Sputtering targets technology has been used in large area coating manufacturing of architectural glass and flat panel displays.
Tubular Target
Rotatable target
Planar sputtering targets
2. Materials & standards
Material | titaniumï¼nickelï¼zirconiumï¼tungsten molybdenumï¼tantalumï¼niobium target |
Standard | ASTM B381/348,F67/136,AMS 4928,DIN,JIS |
Technique | Forged, grinded,CNC Machined |
Purity | 99.99%~99.995% |
Shape | Tube targetãRound targetãTube targetãplate target |
Surface | CNC lathe surface. |
3. Application
Electroplating
Decorative Coating
Hardened Coating
Semiconductor & Electronics
Architectural Coating
Automotive Glass Coating
4. Details
Titanium round target | Titanium plate target | ||||
Normal Size | Material | Composition | Normal Size | Material | Composition |
Dia40Ã17mm | Gr1 Gr2 4N Ti | 99.7% 99.5% 99.99% | 12Ã132Ã1701mm | Gr1 Gr2 4N Ti | 99.7% 99.5% 99.99% |
Dia63Ã32mm | 13Ã132Ã1701mm | ||||
Dia62Ã38mm | 12Ã170Ã830mm | ||||
Dia100Ã32mm | 8Ã133Ã410mm | ||||
Dia100Ã40mm | 8Ã158Ã1108mm | ||||
Dia100Ã45mm | 10Ã159Ã1519mm | ||||
Dia152.4Ã42mm | 18Ã152Ã635mm | ||||
Dia105Ã16mm | 20Ã190Ã740mm |
Note: Non-standard sizes are also available.
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