Quick Details
- Sample stage:diam185mm
- Sputtering target head:2-inch
- Chamber size:diam300mm×300mm
- Chamber material:Stainless steel
- Molecular pump:600L/S
- rotary vane pump:1.1L/S
- RF power supply:300W*2
- Supply voltage:AC220V,50Hz
- Overall size:600mm×650mm×1280mm
- Total Weight:About 300kg
- Processing Time:30days
- Port:qingdao,shanghai,
- Supply Ability: 50 Sets Per Month
- Brand Name:CYKY
- Classification:lab vacuum pvd
- Model Number:CY-MSP300S-2RF
- Place of Origin:zhengzhou,henan,china
- Brand Name:CYKY
Dual-target RF magnetron sputtering coater CY-MSP300S-2RF
Dual-target RF magnetron sputtering coater is a
cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to
choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with two 300W RF power supply. The DC power supply can be used for the
preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel
high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.
The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is
controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with
an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further
improve your experimental efficiency.
Dual-target RF magnetron
sputtering coater application:
The device can be used for preparing single or
multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the
dual-target magnetron sputtering coating machine is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing a material film in
a laboratory.
Dual-target RF magnetron
sputtering coater technical parameters:
Sample stage
Size:diameter185mm
Temperature control accuracy:±1 degree Celsius
Heating temperature:Max 500degree Celsius
Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head
2-inch*2 (1-inch 2-inch optional)
Water chiller:Circulating water chiller with flow rate of 10L/min
Vacuum chamber
Chamber size:diameter 300mm×300mm
Watch window: daimeter100mm
Chamber material:Stainless steel
Opening mode:Top cover open
Mass flowmeter
2 channels; measuring range 100SCCM; 100SCCM (can be
customized according to customer needs)
Vacuum system
Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum: 1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to
1.0E-3Pa in 20 minutes
Power configuration
RF power supply * 2;Max output power:RF 300 W
Other parameters
Supply voltage:AC220V,50Hz
Overall size:600*650*1280 mm
Total power:2.5KW
Total Weight:About 300kg