Laboratory 2-target DC Magnetron Metal Sputter PVD Coating Machine

Dual-target DC magnetron sputtering coater CY-MSP300S-2DC Dual-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings. The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency. Dual-target DC magnetron sputtering coater application: This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory. Dual-target DC magnetron sputtering coater technical parameters: Sample stage Size: diam185mm Temperature control accuracy:+-1 degree Celsius Heating temperature:Max 500 degree Celsius Rotate speed:1-20rpm adjustable Magnetron Sputtering   target head Quantity:2-inch*2 (1-inch,2-inch optional) Water chiller:Circulating water chiller   with flow rate of 10 L/min Cooling mode:Water cooling Vacuum chamber Chamber size:300mm * 300mm Watch window:diam 100mm Chamber material:Stainless steel Opening mode:Top cover open Mass flowmeter 2 channels; measuring   range 100SCCM; 100SCCM (can be customized according to customer needs) Vacuum system Model:CY-GZK103-A Pumping interface:KF40 Molecular pump:CY-600 Exhaust interface:KF16 Backing pump:rotary vane pump Vacuum measurement:Compound vacuum gauge Ultimate vacuum:1.0E-5Pa Power supply:AC;220V 50/60Hz Pumping rate：Molecular pump: 600L/S rotary vane pump: 1.1L/S   Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes Power configuration DC power supply*2；Max output power：DC 500W Other parameters Supply voltage:AC220V,50Hz Overall size:600*650*1280 mm Total power:2.5KW Total Weight:About 300kg