High Purity Tungsten Target,Tungsten Titanium Target

Application: High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells. Specification: Name Molecular formula Specification Size Relative density Grain size Defect rate Tungsten target W 4N（99.99%） Inch mm ≥99% ≯50µm 0 5N（99.999%） D（6,8,10,12） H（0.25,0.5,0.75） Diameter 150～350 Thickness 6～25 Tungsten Titanium Target   4N（99.99%） ≥99% ≯50µm 0 4N5（99.995%）